Simulation tool design for the two-axis nano stage of lithography systems
Jongchul Jung , Kunsoo Huhb, Mechatronics, August 2010, Volume 20, Issue 5, pp. 574-581.
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Abstract
For advanced electron beam lithography systems, a simulation tool for a two-axis nano stage is developed in this paper. The stage is equipped with piezo-actuators and flexure guides. Even if piezo-actuators are believed to be feasible for realizing nano scale motions, it is difficult to predict their characteristics due to their nonlinearities such as hysteresis and creep. In this paper, the nonlinear properties are modeled considering the input conditions. In detail, the hysteresis is described as a first order differential equation with 24 sets of the hysteresis parameters and the creep is modeled as a time-dependent logarithmic function with two sets of creep parameters. The characteristics of the flexure guides are analyzed using the finite element method and are embodied into a multi-body-dynamics simulation tool. The dynamic behavior of the simulation tool is compared with the experimental data.
How Multibody Dynamics Simulation Technology is Used
RecurDyn is used to simulate two-axis nano stages equipped with piezo-actuators and flexure guides. Modal data is obtained using ANSYS and then interfaced with RecurDyn. The accuracy was verified using experimental data. This verified model can now be used to test design improvements in rapid succession.
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